Reference

 •  Endorsement
 •  Publications
 •  Patents

Endorsement

Raphael Baumann, Technical expert on Space imaging, Ministry of Defense DGA
Mr. Toren has done first class engineering work on the concept of a TDI image sensor for earth observation by satellite. Together with the optimization of the process as well as the device his invention has an excellent performance by simply combining a CCD and a CMOS image pixel in a single camera chip. The total concept can easily be integrated in a standard CMOS process which allows low cost development and high performance on-chip arithmetic to convert the recorded information to a high quality noise free picture.

Stephan Louwers, Business Unit Manager Contract Manufacturing at Tronics Microsystems
I hired Willem-Jan as a consultant from May2012 to April 2013 to help in the development and industrialization of two important projects. His understanding of wafer processing has been key to pinpoint the root case of a number of issues, and to subsequently resolve them. His systematic approach has allowed us to identify the main potential yield detractors and to avoid the associated pitfalls. I would recommend him to anybody looking for an experienced engineer with extensive technical background.

Daniel Durini, Group Manager Optoelectronic Devices, Fraunenhofer Institute for Microelectronics Circuits and Systems IMS
We worked together with Willem-Jan Toren on the development of a process module to be included into a standard 150nm CMOS process enabling the fabrication of four transistor pixel cells based on buried photodetector structures. In that particular project, all the experience Willem-Jan already had in the area of CMOS process development and design of pixel structures proved to be a big asset. His openness in the discussion and the constructive critic were highly appreciated, as well as his project management skills. Although the project could not be completed, the first preliminary results were very encouraging also thank to Willem-Jans collaborations and inputs. We would be very glad to collaborate with him on any future developments.

Robert van de Laar, Senior Process Engineer, Philips Innovations Services MiPlaza, Philips Corporate Technologies
I have experienced Willem-Jan as an excellent project-leader with hands-on approach. In practice this means that he understands flowchart related problems and that he's able to think out loud on possible solutions, supported by his extensive and valuable network and down to earth mentality. Besides that he's a polite and fun guy.

Nhan Do, Ph. D., Director of Technology Development, Silicon Storage Technology, a Subsidiary of Microchip Technology.
I have known WJT for almost 3 years since we started our collaboration on an embedded flash integration project. He is well liked by members of the technical team for his strong leadership. His deep understanding of the CMOS process integration had led the team to overcome some road blocks with innovative process and device ideas. I highly believe WJ would be a valuable addition to any technology team he will be working with.

Publications

Thesis: The characterization of dark current generation centers in CCD frame transfer image sensors, W.J. Toren, Enschede 14 February 1997, ISBN 90-74445-31-4

W.J. Toren, J. Bisschop, "A CCD delay line to determine low concentrations of bulk traps in silicon", ESSDERC proceedings page 623, 1992, Pub. Elsevier, ISBN 0-444-89478-0.

W.J. Toren, J. Bisschop, "Dark current characterization in CCDs", ESSDERC proceedings page 373, 1993, Pub. Editions Frontieres, ISBN 2-86332-135-8.

W.J. Toren, J. Bisschop, "Metal contamination characterization in CCD image sensors", IEDM Technical Digest, page 163, 1995, ISBN 0-7803-2700-4.

W.J. Toren, J. Bisschop, F.P. Widdershoven, "A new measurement method of interface state parameters, based on dark current characterization in CCDs", ESSDERC proceedings page 387, 1996, Pub. Editions Frontieres, ISBN 2-86332-196-X.

W.J. Toren, J. Bisschop, "A model for the diffusion behaviour of generation centers in CCDs", IEEE workshop on charge coupled devices and advanced image sensors, June 1997, Brugge - Belgium.

W.J. Toren, F. Arnaud, "Gate current scaling rules characterization, an efficient tool for gate oxide optimisation in 0.12 ým CMOS technologies", ESSDERC proceedings page 243, 2001, Pub. Editions Frontieres.

W.J. Toren, E. Perrin, M. Lunnenborg, "Characterization of the Diode Leakage Current in Advanced 0.12 um CMOS Technology (Does stress play a role?)", International Workshop on junction technology, 29-30 november 2001, Tokyo Japan.

T.Devoivre et.al., "Validated 90nm CMOS Technology Platform with Low-k Copper Interconnects for Advanced System-on-Chip (SoC)", MTDT, International Workshop on memory technology, 12 July 2002, Isle of Bendor, France.

G. Toulon et.al., "Analysis of technological concerns on electrical characteristics of SOI power LUDMOS transistors", Proceedings of The 22nd International Symposium on Power Semiconductor Devices & ICs, Hiroshima, page173.

Patents

SemiConsultor, W.J. Toren, "Non volatile memory cell, method for programming and/or erasing such a cell and non volatile memory device"

SemiConsultor, W.J. Toren, "Non volatile memory cell, method for programming and/or erasing such a cell and non volatile memory device"

SemiConsultor, W.J. Toren, "Color filters with high Quantum efficiency for CCD image pixels in a low cost CMOS process.",

SemiConsultor, W.J. Toren, "LCDmos high voltage Low Cost, CMOS compatible Lateral Drift MOS",

SemiConsultor, W.J. Toren, "CCDmos: a technology for very high performance TDI image sensors in low cost CMOS",

W.J. Toren, D.W.E Verbugt. J.P.V. Maas, W. Hoekstra, H.O. Folkerts, "Opto-Electronic semiconductor device, method of manufacturing same, and camera provided with such a device", WO 2005/076360 A1

J.P.V. Maas, W.J. Toren, H.O. Folkerts, W.H. Maes, W. Hoeksrta, D.W.E. Verbugt, D.H.J.M. Hermes,"Semiconductor device with an image sensor and method for manufacturing of such a device", WO 2006/117725 A1

W.J. Toren, "Method of forming electrical connection means of ultimate dimensions and device comprising such connection means", WO 2002/071597 A1

W.J. Toren, B. Villard, E. Hugonnard-Bruyere, G. Toulon, F. Morancho, I. Cortes Mayol, T. Pedron,"Enhanced HVPmos", WO 2012/0267717 A1

W.J. Toren, et.al.,"SELF-ALIGNED STACK GATE STRUCTURE FOR USE IN A NON-VOLATILE MEMORY ARRAY AND A METHOD OF FORMING SUCH STRUCTURE", US 2013/0234223 A1

Projects

Via 2018, W.J. Toren, B. Twijnstra Haviksoog

Via 2019, W.J. Toren, B. Twijnstra Haviksoog3D